C.P. Lungu, M.Futsuhara, O. Takai, M. Braic, G. Musa, Noble gas influence on reactive radio frequency magnetron sputter deposition of TiN films, Vacuum, 51/4 (1998) 635-640

Title: Noble gas influence on reactive radio frequency magnetron sputter deposition of TiN films

Abstract: The noble gases' (Ar, He and Ne) influence on the TiN deposition by reactive radio frequency (rf) magnetron sputtering have been studied. Effects of the interelectrode distance and the discharge power were also taken into account The optical diagnostics of plasma was carried out The characteristics of Ti emission (395.82 nm) from titanium atoms and N-2(+) emission (391.44 nm) of the first negative system were investigated in detail. Ti (395.82 nm)/Ni-2(+) (391.44 nm) intensity ratio between Ti/N-2 emission was correlated with the deposition rate of the films. The enhancement of the TiN (111) peak intensity in the neon or helium presence in the ternary gas mixtures (Ar + N-2 + Ne), (Ar + N-2 + He) was emphasized

Keywords: TiN thin films, reactive deposition

Author: M. Braic