M. Braic, C.N. Zoita, V. Braic, A. Kiss, M.(Popescu, G. M); Musa, G (Musa, G), Influence of He, Ne and Kr addition in reactive Ar/N-2 dc magnetron plasma on TiN deposition, Vacuum 53/1-2 (1999) 41-45   

Title: Influence of He, Ne and Kr addition in reactive Ar/N-2 dc magnetron plasma on TiN deposition    

Abstract: A reactive DC magnetron discharge produced in a TIN deposition system was investigated using optical emission spectroscopy. The influence of He, Ne and Kr addition into an Ar + N-2 working atmosphere was investigated. Addition of small percentages of He or Ne in the working atmosphere of Ar + N-2, caused a decrease of the N-2(+) (B)/N-2(C) ratio, whle with Kr addition the ratio increased. The known decrease of the relative intensity of Ti lines for N-2 addition was also observed for He addition, while it increases when Ne and Kr are added. XRD analysis of TiN thin films revealed that He addition determines the same effect as N-2. This behavior is explained by N and N+ density increase for He addition.

Keywords: emission spectroscopy; magnetron discharge; TiN films

Author: M. Braic